Invention Application
WO0037987A3 METHOD FOR THE ELECTRONIC CALIBRATION OF AN EXPOSURE METER IN AN OPTICAL SYSTEM
审中-公开
光测量装置的电子校准的光学系统中的方法
- Patent Title: METHOD FOR THE ELECTRONIC CALIBRATION OF AN EXPOSURE METER IN AN OPTICAL SYSTEM
- Patent Title (中): 光测量装置的电子校准的光学系统中的方法
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Application No.: PCT/DE9904005Application Date: 1999-12-17
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Publication No.: WO0037987A3Publication Date: 2000-11-23
- Inventor: STENZEL RUEDIGER , RUEHL HELMUT , KNOBLICH JOHANNES , KOHLE DIRK
- Applicant: LEICA MICROSYSTEMS , ZEISS CARL JENA GMBH , STENZEL RUEDIGER , RUEHL HELMUT , KNOBLICH JOHANNES , KOHLE DIRK
- Assignee: LEICA MICROSYSTEMS,ZEISS CARL JENA GMBH,STENZEL RUEDIGER,RUEHL HELMUT,KNOBLICH JOHANNES,KOHLE DIRK
- Current Assignee: LEICA MICROSYSTEMS,ZEISS CARL JENA GMBH,STENZEL RUEDIGER,RUEHL HELMUT,KNOBLICH JOHANNES,KOHLE DIRK
- Priority: DE19859159 1998-12-21
- Main IPC: G02B21/36
- IPC: G02B21/36
Abstract:
The invention relates to a calibration method for an exposure meter of a microscope (1) in which the ray bundle (4; 7) exiting from the microscope objective (22) is divided in to a first partial ray bundle (8) which is guided to an eyepiece (8) in which a grid-line reticle (24) having a focussing mark is positioned and a second partial ray bundle (4) which is guided to a sensor (10) made of electrooptical pixel elements (12) downstream of which an electronic processing unit is positioned. According to the method a calibration sample (15) having a calibration reference point is arranged on the microscope table (3); by displacing the microscope table (2) the calibration reference point of the calibration sample (15) is moved into a specified positional relationship to the focussing mark of the grid-line reticle (24); in this positional relationship the calibration sample (15) having the calibration reference point is imaged on the pixel elements (12) of the sensor (10); and among the pixel elements (12) of the sensor (10) the pixel element on which the image of the calibration reference point falls is chosen as the reference pixel element for future exposure measurements.
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