Invention Application
- Patent Title: PURGE MONITORING SYSTEM FOR GAS DISCHARGE LASER
- Patent Title (中): 气体放电激光灌装监控系统
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Application No.: PCT/US2002/000958Application Date: 2002-01-14
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Publication No.: WO2002061897A1Publication Date: 2002-08-08
- Inventor: NEWMAN, Peter, C. , VAN DOORN, John , FULLEN, Darrell, W. , CLOPTON, William, H. , ROKNI, Shahryar
- Applicant: CYMER, INC. , NEWMAN, Peter, C. , VAN DOORN, John , FULLEN, Darrell, W. , CLOPTON, William, H. , ROKNI, Shahryar
- Applicant Address: Legal Department - M/S 1-2A, 16750 Via Del Campo Court, San Diego, CA 92127-1712 US
- Assignee: CYMER, INC.,NEWMAN, Peter, C.,VAN DOORN, John,FULLEN, Darrell, W.,CLOPTON, William, H.,ROKNI, Shahryar
- Current Assignee: CYMER, INC.,NEWMAN, Peter, C.,VAN DOORN, John,FULLEN, Darrell, W.,CLOPTON, William, H.,ROKNI, Shahryar
- Current Assignee Address: Legal Department - M/S 1-2A, 16750 Via Del Campo Court, San Diego, CA 92127-1712 US
- Agency: ROSS, John, R.
- Priority: US09/771,789 20010129; US09/837,150 20010418
- Main IPC: H01S3/22
- IPC: H01S3/22
Abstract:
A laser component purge system for discharge lasers. The LNP (2), the output coupler and the wavemeter (14) are contained in sealed chambers each having a purge inlet port and a purge outlet port. Purge gas such as N 2 is directed to each of the inlet ports. A purge monitoring system (17) is provided which monitors the purge flow and provides one or more signals to a processor which is programmed to minimize laser timeouts attributable to purge conditions without endangering the purged optical components. In a preferred embodiment, gas exiting the outlet ports are directed to flow monitors which provide the one or more signals to the processor. Purge gas may be exhausted or recirculated.
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