A method and apparatus for replicating patterns with a resolution well below the diffraction limit, uses broad beam illumination and standard photoresist. In particular, visible exposure (λ = 410 nm) of silver nanoparticles in close proximity to a thin film of g-line resist (AZ 1813) can produce selectively exposed areas with a diameter smaller than λ/20. The technique relies on the local field enhancement around metal nanostructures when illuminated at the surface plasmon resonance frequency. The method is extended to various metals, photosensitive layers, and particle shapes.