Invention Application
- Patent Title: 露光装置にパージガスを供給する方法、露光装置、及びデバイスの製造方法
- Patent Title (English): Method for feeding purge gas to exposure apparatus, exposure apparatus, and method for manufacturing device
- Patent Title (中): 将进料气体送入曝光装置的方法，曝光装置和制造装置的方法
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Application No.: PCT/JP2002/010985Application Date: 2002-10-23
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Publication No.: WO2003036695A1Publication Date: 2003-05-01
- Inventor: 西川 仁 , 大和 壮一
- Applicant: 株式会社 ニコン , 西川 仁 , 大和 壮一
- Applicant Address: 〒100-8331 東京都 千代田区 丸の内3丁目2番3号 Tokyo JP
- Assignee: 株式会社 ニコン,西川 仁,大和 壮一
- Current Assignee: 株式会社 ニコン,西川 仁,大和 壮一
- Current Assignee Address: 〒100-8331 東京都 千代田区 丸の内３丁目２番３号 Tokyo JP
- Agency: 恩田 博宣
- Priority: JP2001-325573 20011023
- Main IPC: H01L21/027
- IPC: H01L21/027
Abstract:
A method for purging a light−absorbing material from an optical path of exposure light with high efficiency and economically. When an exposure apparatus body (12) and a light source (11) are started up, a purge gas is fed to the exposure apparatus at a high flow rate. The illuminance of the exposure light is measured at an illumination optical system (20) relatively near the light source (11), and at a place near a substrate (W) relatively far from the light source (11). When the ratio between the measured illuminances is in a predetermined range, the purge gas feed mode is changed to a low flow rate mode.
Information query
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