Invention Application
- Patent Title: ANTENNA FOR PRODUCING UNIFORM PROCESS RATES
- Patent Title (中): 用于生产统一过程速率的天线
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Application No.: PCT/US2004/004399Application Date: 2004-02-12
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Publication No.: WO2004077608A2Publication Date: 2004-09-10
- Inventor: WILCOXSON, Mark, H. , BAILEY, Andrew, D., III
- Applicant: LAM RESEARCH CORPORATION , WILCOXSON, Mark, H. , BAILEY, Andrew, D., III
- Applicant Address: 4650 Cushing Parkway, Fremont, CA 94538 US
- Assignee: LAM RESEARCH CORPORATION,WILCOXSON, Mark, H.,BAILEY, Andrew, D., III
- Current Assignee: LAM RESEARCH CORPORATION,WILCOXSON, Mark, H.,BAILEY, Andrew, D., III
- Current Assignee Address: 4650 Cushing Parkway, Fremont, CA 94538 US
- Agency: VILLENEUVE, Joseph, M.
- Priority: US10/374,868 20030224
- Main IPC: H01Q
- IPC: H01Q
Abstract:
An antenna arrangement for generating an electric field inside a process chamber through a window. Generally, the antenna arrangement comprises an outer loop, comprising a first outer loop turn disposed around an antenna axis, an inner loop, comprising a first inner loop turn disposed around the antenna axis, wherein the inner loop is closer to the antenna axis than the outer loop is to the antenna axis in each azimuthal direction, and a radial connector radially electrically connecting the outer loop to the inner loop, wherein the radial connector is placed a large distance from the window.
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