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Invention Application
WO2005101522A3 PROCESS AND DEVICE FOR CLEANING AND ETCHING A SUBSTRATE WITH A TRANSPARENT CONDUCTIVE OXIDE LAYER 审中-公开
程序进行清洗和蚀刻基材提供用于实施该方法的透明导电氧化物层和设备

PROCESS AND DEVICE FOR CLEANING AND ETCHING A SUBSTRATE WITH A TRANSPARENT CONDUCTIVE OXIDE LAYER
Abstract:
A simple process is disclosed for treating substrates having pre-structured zinc oxide layers on rigid or flexible supports. The ZnO is treated with an etching medium then with a cleaning liquid. The treatment with the etching and cleaning liquids is carried out while the substrate is conveyed through a device. The process is technically simple to implement and makes it possible to regularly and homogeneously roughen and texturise ZnO layers of up to 1 m 2 . The device for treating substrates having pre-structured zinc oxide layers on rigid or flexible supports has for that purpose a first means for treating the substrate with an etching liquid, a second means for treating the substrate with a cleaning liquid, and another means, in particular transport rollers, for conveying the substrate from the first to the second means.
Abstract(Chinese):

本发明描述了具有布置在预结构化氧化锌层的刚性或柔性支撑件，其中，所述氧化锌用蚀刻介质处理基材的处理的简单方法，并且随后用清洗液进行处理。 同时衬底通过装置输送执行与蚀刻液和清洗液中的处理。 这个过程是处理在技术上较不复杂的，并定期允许最多至1m 2 大的ZnO层的均匀粗面化处理和纹理。 用于处理基板的设备，它具有设置在预结构化氧化锌层的刚性或柔性支撑件，具有用于此目的的第一装置，用于用蚀刻液处理衬底，用于与清洗液和另外的装置处理基材，尤其是输送辊，用于第二装置 输送从所述第一到所述第二部件的基板。

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