Invention Application
- Patent Title: OPTICAL METROLOGY OPTIMIZATION FOR REPETITIVE STRUCTURES
- Patent Title (中): 重复结构的光学计量优化
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Application No.: PCT/US2006004151Application Date: 2006-02-06
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Publication No.: WO2006091361A3Publication Date: 2007-03-22
- Inventor: VOUNG VI , BAO JUNWEI , BISCHOFF JOERG
- Applicant: TOKYO ELECTRON LTD , VOUNG VI , BAO JUNWEI , BISCHOFF JOERG
- Assignee: TOKYO ELECTRON LTD,VOUNG VI,BAO JUNWEI,BISCHOFF JOERG
- Current Assignee: TOKYO ELECTRON LTD,VOUNG VI,BAO JUNWEI,BISCHOFF JOERG
- Priority: US6130305 2005-02-18
- Main IPC: G01B3/22
- IPC: G01B3/22 ; G01B11/24
Abstract:
The top-view profiles of repeating structures in a wafer are characterized and parameters to represent variations in the top- view profile of the repeating structures are selected. An optical metrology model is developed that includes the selected top-view profile parameters of the repeating structures. The optimized optical metrology model is used to generate simulated diffraction signals that are compared to measured diffraction signals.
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