Invention Application
WO2007092229A2 TRANSFORMING METROLOGY DATA FROM A SEMICONDUCTOR TREATMENT SYSTEM USING MULTIVARIATE ANALYSIS
审中-公开
使用多重分析从半导体处理系统转换计量数据
- Patent Title: TRANSFORMING METROLOGY DATA FROM A SEMICONDUCTOR TREATMENT SYSTEM USING MULTIVARIATE ANALYSIS
- Patent Title (中): 使用多重分析从半导体处理系统转换计量数据
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Application No.: PCT/US2007/002665Application Date: 2007-01-30
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Publication No.: WO2007092229A2Publication Date: 2007-08-16
- Inventor: VUONG, Vi , BAO, Junwei , CHEN, Yan , HEIKO, Weichert , EGRET, Sebastien
- Applicant: TOKYO ELECTRON LIMITED , VUONG, Vi , BAO, Junwei , CHEN, Yan , HEIKO, Weichert , EGRET, Sebastien
- Applicant Address: TBS Broadcast Center, 3-6 Akasaka 5-chome, Minato-ku, Tokyo 107 JP
- Assignee: TOKYO ELECTRON LIMITED,VUONG, Vi,BAO, Junwei,CHEN, Yan,HEIKO, Weichert,EGRET, Sebastien
- Current Assignee: TOKYO ELECTRON LIMITED,VUONG, Vi,BAO, Junwei,CHEN, Yan,HEIKO, Weichert,EGRET, Sebastien
- Current Assignee Address: TBS Broadcast Center, 3-6 Akasaka 5-chome, Minato-ku, Tokyo 107 JP
- Agency: YIM, Peter J. et al.
- Priority: US11/349,773 20060207
Abstract:
Metrology data from a semiconductor treatment system is transformed using multivariate analysis. In particular, a set of metrology data measured or simulated for one or more substrates treated using the treatment system is obtained. One or more essential variables for the obtained set of metrology data is determined using multivariate analysis. A first metrology data measured or simulated for one or more substrates treated using the treatment system is obtained. The first obtained metrology data is not one of the metrology data in the set of metrology data earlier obtained. The first metrology data is transformed into a second metrology data using the one or more of the determined essential variables.
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