Invention Application
- Patent Title: SYSTEM AND METHOD FOR PROVIDING ADJUSTABLE BALLAST FACTOR
- Patent Title (中): 用于提供可调压力因子的系统和方法
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Application No.: PCT/US2008/004571Application Date: 2008-04-08
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Publication No.: WO2008124159A2Publication Date: 2008-10-16
- Inventor: CHITTA, Venkatesh , MACADAM, Russell , WALMA, Kenneth D., Jr.
- Applicant: LUTRON ELECTRONICS CO., INC. , CHITTA, Venkatesh , MACADAM, Russell , WALMA, Kenneth D., Jr.
- Applicant Address: 7200 Suter Road Coopersburg, Pennsylvania 18036 US
- Assignee: LUTRON ELECTRONICS CO., INC.,CHITTA, Venkatesh,MACADAM, Russell,WALMA, Kenneth D., Jr.
- Current Assignee: LUTRON ELECTRONICS CO., INC.,CHITTA, Venkatesh,MACADAM, Russell,WALMA, Kenneth D., Jr.
- Current Assignee Address: 7200 Suter Road Coopersburg, Pennsylvania 18036 US
- Agency: DUJMICH, Louis, C. et al.
- Priority: US11/733,093 20070409
- Main IPC: H05B37/02
- IPC: H05B37/02
Abstract:
The invention includes an electronic ballast that is operable to receive a ballast factor setting that enables the ballast to provide a desired ballast factor when the ballast drives a lamp. The electronic ballast includes an input that is adapted to receive a ballast factor setting that represents a desired ballast factor for the ballast and a respective lamp. The ballast further includes a memory that is adapted to store the ballast factor setting, and the ballast includes a processor that uses the ballast factor setting stored in the memory to cause the ballast to provide the desired ballast factor as the ballast drives the lamp. The ballast includes means for substantially preventing subsequently changing the ballast factor setting stored in the memory. Various business methods are further provided as a function of the electronic ballast.
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