Invention Application
- Patent Title: METHOD OF FERROELECTRONIC DOMAIN INVERSION AND ITS APPLICATIONS
- Patent Title (中): 电子域反演方法及其应用
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Application No.: PCT/CA2008/001390Application Date: 2008-07-31
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Publication No.: WO2009015474A1Publication Date: 2009-02-05
- Inventor: HU, Ye
- Applicant: HU, Ye
- Applicant Address: 139 Huntingwood Avenue Dundas, Ontario L9H 6X7 CA
- Assignee: HU, Ye
- Current Assignee: HU, Ye
- Current Assignee Address: 139 Huntingwood Avenue Dundas, Ontario L9H 6X7 CA
- Agency: HU, Ye
- Priority: US60/952,969 20070731
- Main IPC: G02F1/05
- IPC: G02F1/05 ; G02F1/355 ; G02F1/37 ; H01S3/06 ; H01S3/0933 ; H01S3/14
Abstract:
The present invention is related to a method to control the nucleation and to achieve designed domain inversion in single-domain ferroelectric substrates (e.g. MgO doped LiNbO 3 substrates). It includes the first poling of the substrate with defined electrode patterns based on the corona discharge method to form shallow domain inversion (i.e. nucleation) under the electrode patterns, and is followed by the second crystal poling based on the electrostatic method to realize deep uniform domain inversion. Another objective of the present invention is to provide methods to achieve broadband light sources using a nonlinear crystal with a periodically domain inverted structure.
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