The present invention concerns a pressure-sensitive adhesive film and a method for back-grinding semiconductor wafers using the same. The present invention provides, for example, a pressure-sensitive adhesive film having excellent brittleness and adhesion in the semiconductor production process, as well as a superior cushioning, and that is capable of markedly improving production efficiency in the wafer back-grinding process of semiconductor production. In addition, the present invention provides a pressure-sensitive adhesive film having superior releasability, re-releasable characteristics, and wafer wettability, and also exhibiting excellent water resistance; and a back-grinding method using the same.