发明申请
- 专利标题： USE OF PHOTOSYSTEM II INHIBITORS ON CULTIVATED PLANTS
- 专利标题（中）： 光化学II抑制剂在加工植物上的应用
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申请号： PCT/EP2009063872申请日： 2009-10-22
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公开(公告)号： WO2010046430A3公开(公告)日： 2011-04-21
- 发明人: GEWEHR MARKUS , GLADWIN ROBERT JOHN , LOGEMANN JUERGEN , PUENTE PILAR , STUIVER MAARTEN HENDRIK , VOESTE DIRK
- 申请人： BASF SE , GEWEHR MARKUS , GLADWIN ROBERT JOHN , LOGEMANN JUERGEN , PUENTE PILAR , STUIVER MAARTEN HENDRIK , VOESTE DIRK
- 专利权人： BASF SE,GEWEHR MARKUS,GLADWIN ROBERT JOHN,LOGEMANN JUERGEN,PUENTE PILAR,STUIVER MAARTEN HENDRIK,VOESTE DIRK
- 当前专利权人： BASF SE,GEWEHR MARKUS,GLADWIN ROBERT JOHN,LOGEMANN JUERGEN,PUENTE PILAR,STUIVER MAARTEN HENDRIK,VOESTE DIRK
- 优先权： EP08167262 2008-10-22
- 主分类号： A01N35/10
- IPC分类号： A01N35/10 ; A01N37/22 ; A01N37/40 ; A01N43/30 ; A01N43/54 ; A01N43/58 ; A01N43/64 ; A01N43/70 ; A01N43/707 ; A01N43/88 ; A01N47/06 ; A01N47/22 ; A01N47/30 ; A01N47/32 ; A01N47/36
摘要：
The present invention relates to a method for increasing the plant health in a cultivated plant comprising the application of an with a photosynthesis at photosystem Il inhibitor to the cultivated plant, parts of such plants, plant propagation materials, or at the locus of growth of the cultivated plant.
