Invention Application
WO2010099216A2 METHODS FOR FABRICATION OF HIGH ASPECT RATIO MICROPILLARS AND NANOPILLARS
审中-公开
高比例微球和纳米微球的制备方法
- Patent Title: METHODS FOR FABRICATION OF HIGH ASPECT RATIO MICROPILLARS AND NANOPILLARS
- Patent Title (中): 高比例微球和纳米微球的制备方法
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Application No.: PCT/US2010025256Application Date: 2010-02-24
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Publication No.: WO2010099216A2Publication Date: 2010-09-02
- Inventor: HENRY MICHAEL D , HOMYK ANDREW P , SCHERER AXEL , WALAVALKAR SAMEER
- Applicant: CALIFORNIA INST OF TECHN , HENRY MICHAEL D , HOMYK ANDREW P , SCHERER AXEL , WALAVALKAR SAMEER
- Assignee: CALIFORNIA INST OF TECHN,HENRY MICHAEL D,HOMYK ANDREW P,SCHERER AXEL,WALAVALKAR SAMEER
- Current Assignee: CALIFORNIA INST OF TECHN,HENRY MICHAEL D,HOMYK ANDREW P,SCHERER AXEL,WALAVALKAR SAMEER
- Priority: US20852809 2009-02-25; US16428909 2009-03-27
- Main IPC: H01L21/027
- IPC: H01L21/027 ; H01L21/3065 ; H01L31/042
Abstract:
Methods for fabrication of high aspect ratio micropillars and nanopillars are described. Use of alumina as an etch mask for the fabrication methods is also described. The resulting micropillars and nanopillars are analyzed and a characterization of the etch mask is provided.
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