Invention Application
WO2010099544A2 TILED SUBSTRATES FOR DEPOSITION AND EPITAXIAL LIFT OFF PROCESSES
审中-公开
用于沉积和外延提升过程的倾斜基板
- Patent Title: TILED SUBSTRATES FOR DEPOSITION AND EPITAXIAL LIFT OFF PROCESSES
- Patent Title (中): 用于沉积和外延提升过程的倾斜基板
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Application No.: PCT/US2010/025796Application Date: 2010-03-01
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Publication No.: WO2010099544A2Publication Date: 2010-09-02
- Inventor: HE, Gang , HEGEDUS, Andreas G.
- Applicant: ALTA DEVICES, INC. , HE, Gang , HEGEDUS, Andreas G.
- Applicant Address: 3260 Scott Blvd. Santa Clara, CA 95054 US
- Assignee: ALTA DEVICES, INC.,HE, Gang,HEGEDUS, Andreas G.
- Current Assignee: ALTA DEVICES, INC.,HE, Gang,HEGEDUS, Andreas G.
- Current Assignee Address: 3260 Scott Blvd. Santa Clara, CA 95054 US
- Agency: PATTERSON, B. Todd et al.
- Priority: US61/156,404 20090227
- Main IPC: H01L31/042
- IPC: H01L31/042
Abstract:
Embodiments of the invention generally relate to epitaxial lift off (ELO) films and methods for producing such films. Embodiments provide a method to simultaneously and separately grow a plurality of ELO films or stacks on a common support substrate which is tiled with numerous epitaxial growth substrates or surfaces. Thereafter, the ELO films are removed from the epitaxial growth substrates by an etching step during an ELO process. The tiled growth substrate contains the epitaxial growth substrates disposed on the support substrate may be reused to grow further ELO films. In one embodiment, a tiled growth substrate is provided which includes two or more gallium arsenide growth substrates separately disposed on a support substrate having a coefficient of thermal expansion within a range from about 5 10-6 C-1 to about 9 10-6 C-1.
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