Invention Application
- Patent Title: SUPPLY OF A LIQUID-METAL TARGET IN X-RAY GENERATION
- Patent Title (中): 在X射线发生中液体金属目标的供应
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Application No.: PCT/EP2009/002464Application Date: 2009-04-03
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Publication No.: WO2010112048A1Publication Date: 2010-10-07
- Inventor: HEMBERG, Oscar , TUOHIMAA, Tomi , OTENDAL, Mikael
- Applicant: EXCILLUM AB , HEMBERG, Oscar , TUOHIMAA, Tomi , OTENDAL, Mikael
- Applicant Address: Rådjursvägen 16 S-182 76 Stocksund SE
- Assignee: EXCILLUM AB,HEMBERG, Oscar,TUOHIMAA, Tomi,OTENDAL, Mikael
- Current Assignee: EXCILLUM AB,HEMBERG, Oscar,TUOHIMAA, Tomi,OTENDAL, Mikael
- Current Assignee Address: Rådjursvägen 16 S-182 76 Stocksund SE
- Agency: PIERROU, Matthias
- Main IPC: H01J35/08
- IPC: H01J35/08
Abstract:
Closed-loop circulation for providing liquid metal to an interaction region at which an electron beam is to impact upon the liquid metal to produce X-rays is presented. In a method according to the invention, the pressure of the liquid metal is raised to at least 10 bar using a high-pressure pump (312). The pressurized liquid metal is then conducted to a nozzle (332) and ejected into a vacuum chamber (330) in the form of a spatially continuous jet. After passage through the vacuum chamber, the liquid metal is collected in a collection reservoir (334), and the pressure of the liquid metal is raised to an inlet pressure, e.g. using a primer pump (322), suitable for the inlet of the high-pressure pump. The invention also relates to a corresponding circulation system and an X-ray source provided with such circulation system.
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