Invention Application
- Patent Title: METHOD OF DICING A WAFER
- Patent Title (中): 抛光方法
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Application No.: PCT/SG2009/000284Application Date: 2009-08-17
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Publication No.: WO2011021981A1Publication Date: 2011-02-24
- Inventor: XIE, Ling , PREMACHANDRAN, Chirayharikathu, Veedu, Sankarapillai , MYO, Ei Pa Pa , ORATTI KALANDAR, Navas Khan , KRIPESH, Vaidyanathan , NEUZIL, Pavel , LAU, Hon-Shing, John
- Applicant: AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH , XIE, Ling , PREMACHANDRAN, Chirayharikathu, Veedu, Sankarapillai , MYO, Ei Pa Pa , ORATTI KALANDAR, Navas Khan , KRIPESH, Vaidyanathan , NEUZIL, Pavel , LAU, Hon-Shing, John
- Applicant Address: 1 Fusionopolis Way #20-10 Connexis Singapore 138632 SG
- Assignee: AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH,XIE, Ling,PREMACHANDRAN, Chirayharikathu, Veedu, Sankarapillai,MYO, Ei Pa Pa,ORATTI KALANDAR, Navas Khan,KRIPESH, Vaidyanathan,NEUZIL, Pavel,LAU, Hon-Shing, John
- Current Assignee: AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH,XIE, Ling,PREMACHANDRAN, Chirayharikathu, Veedu, Sankarapillai,MYO, Ei Pa Pa,ORATTI KALANDAR, Navas Khan,KRIPESH, Vaidyanathan,NEUZIL, Pavel,LAU, Hon-Shing, John
- Current Assignee Address: 1 Fusionopolis Way #20-10 Connexis Singapore 138632 SG
- Agency: SCHIWECK, Wolfram
- Main IPC: H01L21/00
- IPC: H01L21/00
Abstract:
Embodiments provide a method of dicing a wafer having an active surface and an inactive surface opposing the active surface, wherein the active surface comprises components sensitive to at least one of liquid, pressure and vibration. The method includes applying a protecting layer on at least a portion of the inactive surface of the wafer; and dry dicing through the wafer from the inactive surface of the wafer through the protecting layer and the wafer to form a plurality of dies separated from each other.
Information query
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