Invention Application
- Patent Title: ARTIFICIAL MARBLE HAVING TRANSPARENT AMORPHOUS PATTERN
- Patent Title (中): 具有透明无定形图案的人造大理石
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Application No.: PCT/KR2010007801Application Date: 2010-11-05
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Publication No.: WO2011078476A3Publication Date: 2011-11-03
- Inventor: KIM DONG HEE , PARK EUNG SEO , SON CHANG HO
- Applicant: CHEIL IND INC , KIM DONG HEE , PARK EUNG SEO , SON CHANG HO
- Assignee: CHEIL IND INC,KIM DONG HEE,PARK EUNG SEO,SON CHANG HO
- Current Assignee: CHEIL IND INC,KIM DONG HEE,PARK EUNG SEO,SON CHANG HO
- Priority: KR20090129746 2009-12-23
- Main IPC: B44C5/06
- IPC: B44C5/06 ; C08J5/00 ; C08L33/08
Abstract:
Artificial marble having a transparent amorphous pattern of the present invention comprises a base material portion and a pattern portion, wherein the transparency of the pattern portion is excellent, the specific gravity of the pattern portion is 1.60 or more, and the pattern portion is formed by curing a resin composition comprising a binder selected from the group consisting of a halogenated urethane acrylate, a halogenated epoxy acrylate and a mixture thereof, and an acrylic polymerizable monomer.
Public/Granted literature
- WO2011078476A9 ARTIFICIAL MARBLE HAVING TRANSPARENT AMORPHOUS PATTERN Public/Granted day:2011-09-01
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