Invention Application
WO2012133939A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION
审中-公开
抗紫外线或辐射敏感性树脂组合物，其抗紫外线或辐射敏感性树脂膜及其使用组合物形成图案的方法
- Patent Title: ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION
- Patent Title (中): 抗紫外线或辐射敏感性树脂组合物，其抗紫外线或辐射敏感性树脂膜及其使用组合物形成图案的方法
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Application No.: PCT/JP2012/059300Application Date: 2012-03-29
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Publication No.: WO2012133939A1Publication Date: 2012-10-04
- Inventor: TAKAHASHI, Toshiya , TAKIZAWA, Hiroo , TSUBAKI, Hideaki , HIRANO, Shuji , TSUCHIMURA, Tomotaka
- Applicant: FUJIFILM Corporation , TAKAHASHI, Toshiya , TAKIZAWA, Hiroo , TSUBAKI, Hideaki , HIRANO, Shuji , TSUCHIMURA, Tomotaka
- Applicant Address: 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620 JP
- Assignee: FUJIFILM Corporation,TAKAHASHI, Toshiya,TAKIZAWA, Hiroo,TSUBAKI, Hideaki,HIRANO, Shuji,TSUCHIMURA, Tomotaka
- Current Assignee: FUJIFILM Corporation,TAKAHASHI, Toshiya,TAKIZAWA, Hiroo,TSUBAKI, Hideaki,HIRANO, Shuji,TSUCHIMURA, Tomotaka
- Current Assignee Address: 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620 JP
- Agency: KURATA, Masatoshi et al.
- Priority: JP2011-076093 20110330
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/004 ; H01L21/027
Abstract:
Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (P) containing an acid-decomposable repeating unit (A), which resin when acted on by an acid, increases its solubility in an alkali developer, a compound (Q) that when exposed to actinic rays or radiation, generates an acid, and a compound (R) expressed by general formula (1) or (2) below.
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