Invention Application
- Patent Title: POLYSILICON SYSTEM
- Patent Title (中): 多晶系统
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Application No.: PCT/US2012033664Application Date: 2012-04-13
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Publication No.: WO2012142514A2Publication Date: 2012-10-18
- Inventor: WILLIAMS DAVID P , KANOFF NANCY
- Applicant: REC SILICON INC , WILLIAMS DAVID P , KANOFF NANCY
- Assignee: REC SILICON INC,WILLIAMS DAVID P,KANOFF NANCY
- Current Assignee: REC SILICON INC,WILLIAMS DAVID P,KANOFF NANCY
- Priority: US201113087256 2011-04-14
Abstract:
A polysilicon system comprises polysilicon in at least three form-factors, or shapes, providing for an enhanced loading efficiency of a mold or crucible. The system is used in processes to manufacture multi-crystalline or single crystal silicon.
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