Invention Application
- Patent Title: MASS SPECTROMETRY FOR GAS ANALYSIS WITH A ONE-STAGE CHARGED PARTICLE DEFLECTOR LENS BETWEEN A CHARGED PARTICLE SOURCE AND A CHARGED PARTICLE ANALYZER BOTH OFFSET FROM A CENTRAL AXIS OF THE DEFLECTOR LENS
- Patent Title (中): 气体分析用气体分析与充电颗粒源和充电颗粒分析仪之间的一级充电颗粒偏光镜透镜从偏光镜的中心轴偏移
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Application No.: PCT/US2012038271Application Date: 2012-05-17
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Publication No.: WO2012170168A2Publication Date: 2012-12-13
- Inventor: SHAW PHILIP NEIL , BATEY JONATHAN HUGH
- Applicant: MKS INSTR INC , SHAW PHILIP NEIL , BATEY JONATHAN HUGH
- Assignee: MKS INSTR INC,SHAW PHILIP NEIL,BATEY JONATHAN HUGH
- Current Assignee: MKS INSTR INC,SHAW PHILIP NEIL,BATEY JONATHAN HUGH
- Priority: US201113155890 2011-06-08
- Main IPC: H01J3/14
- IPC: H01J3/14 ; H01J49/06
Abstract:
Apparatus, methods and systems are provided to inhibit a sightline from a charged particle source to an analyzer and for changing a baseline offset of an output spectrum of an analyzer. A supply of charged particles is directed through a hollow body of a deflector lens that is positioned relative to a charged particle source and an analyzer. A flow path along a preferred flow path through a deflector lens permits passage of the ions from the source to the detector while inhibiting a sightline from the detector to the source in a direction parallel to the central longitudinal axis of the deflector lens.
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