Invention Application
WO2013040127A3 GAS DELIVERY AND DISTRIBUTION FOR UNIFORM PROCESS IN LINEAR-TYPE LARGE-AREA PLASMA REACTOR
审中-公开
直线式大面积等离子体反应器中均匀工艺的气体输送和分配
- Patent Title: GAS DELIVERY AND DISTRIBUTION FOR UNIFORM PROCESS IN LINEAR-TYPE LARGE-AREA PLASMA REACTOR
- Patent Title (中): 直线式大面积等离子体反应器中均匀工艺的气体输送和分配
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Application No.: PCT/US2012055009Application Date: 2012-09-13
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Publication No.: WO2013040127A3Publication Date: 2013-05-02
- Inventor: WHITE JOHN M , ANWAR SUHAIL , KUDELA JOZEF , SORENSEN CARL A , WON TAE K , CHO SEON-MEE , CHOI SOO YOUNG , PARK BEOM SOO , JOHNSTON BENJAMIN M
- Applicant: APPLIED MATERIALS INC , WHITE JOHN M , ANWAR SUHAIL , KUDELA JOZEF , SORENSEN CARL A , WON TAE K , CHO SEON-MEE , CHOI SOO YOUNG , PARK BEOM SOO , JOHNSTON BENJAMIN M
- Assignee: APPLIED MATERIALS INC,WHITE JOHN M,ANWAR SUHAIL,KUDELA JOZEF,SORENSEN CARL A,WON TAE K,CHO SEON-MEE,CHOI SOO YOUNG,PARK BEOM SOO,JOHNSTON BENJAMIN M
- Current Assignee: APPLIED MATERIALS INC,WHITE JOHN M,ANWAR SUHAIL,KUDELA JOZEF,SORENSEN CARL A,WON TAE K,CHO SEON-MEE,CHOI SOO YOUNG,PARK BEOM SOO,JOHNSTON BENJAMIN M
- Priority: US201161535207 2011-09-15
- Main IPC: C23C16/44
- IPC: C23C16/44 ; C23C16/455 ; H01L21/205
Abstract:
An apparatus for introducing gas into a processing chamber comprising one or more gas distribution tubes having gas-injection holes which may be larger in size, greater in number, and/or spaced closer together at sections of the gas introduction tubes where greater gas conductance through the gas-injection holes is desired. An outside tube having larger gas-injection holes may surround each gas distribution tube. The gas distribution tubes may be fluidically connected to a vacuum foreline to facilitate removal of gas from the gas distribution tube at the end of a process cycle.
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