Invention Application
WO2013062778A1 NOVEL METHOD FOR BALANCING GAS FLOW AMONG MULTIPLE CVD REACTORS
审中-公开
用于在多种CVD反应器之间平衡气体流动的新方法
- Patent Title: NOVEL METHOD FOR BALANCING GAS FLOW AMONG MULTIPLE CVD REACTORS
- Patent Title (中): 用于在多种CVD反应器之间平衡气体流动的新方法
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Application No.: PCT/US2012/059758Application Date: 2012-10-11
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Publication No.: WO2013062778A1Publication Date: 2013-05-02
- Inventor: OH, Jeonghoon , COX, Michael S. , POLYAK, Alexander S.
- Applicant: APPLIED MATERIALS, INC. , OH, Jeonghoon , COX, Michael S. , POLYAK, Alexander S.
- Applicant Address: 3050 Bowers Avenue Santa Clara, California 95054 US
- Assignee: APPLIED MATERIALS, INC.,OH, Jeonghoon,COX, Michael S.,POLYAK, Alexander S.
- Current Assignee: APPLIED MATERIALS, INC.,OH, Jeonghoon,COX, Michael S.,POLYAK, Alexander S.
- Current Assignee Address: 3050 Bowers Avenue Santa Clara, California 95054 US
- Agency: PATTERSON, B. Todd et al.
- Priority: US61/551,603 20111026
- Main IPC: H01L21/205
- IPC: H01L21/205
Abstract:
Gas supply systems and methods are disclosed for solar cell production using multiple parallel reactors. A first gas supply control system has a gas panel having a plurality of gas outlet lines, supplying a first main supply line having a main line mass flow meter measuring the combined total gas mass flow rate in the first main supply line. First, second and third branch lines supplied by the first main supply line each branch line having mass flow controller and one or more control loops established between the mass flow meter and the branch line mass flow controllers. In addition, a second gas supply control system may be coupled to the first gas supply control system to avoid mixing certain gases before they enter the respective reactors to which they are supplied.
Information query
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