Invention Application
WO2014130588A3 THIN-FILM TREATMENT OF HIGH-VALUE GLYCOL AND AMINE SOLVENTS TO REMOVE CONTAMINANTS
审中-公开
用于去除污染物的高价值甘油和胺溶剂的薄膜处理
- Patent Title: THIN-FILM TREATMENT OF HIGH-VALUE GLYCOL AND AMINE SOLVENTS TO REMOVE CONTAMINANTS
- Patent Title (中): 用于去除污染物的高价值甘油和胺溶剂的薄膜处理
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Application No.: PCT/US2014017223Application Date: 2014-02-19
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Publication No.: WO2014130588A3Publication Date: 2014-10-16
- Inventor: HAGERMAN DAVID T , ALASTI PERRY , DILORETO JR ROBERT , SEWARD JR I JOHN
- Applicant: MPR SERVICES INC , HAGERMAN DAVID T , ALASTI PERRY , DILORETO JR ROBERT , SEWARD JR I JOHN
- Assignee: MPR SERVICES INC,HAGERMAN DAVID T,ALASTI PERRY,DILORETO JR ROBERT,SEWARD JR I JOHN
- Current Assignee: MPR SERVICES INC,HAGERMAN DAVID T,ALASTI PERRY,DILORETO JR ROBERT,SEWARD JR I JOHN
- Priority: US201361850544 2013-02-19
- Main IPC: B01D1/22
- IPC: B01D1/22
Abstract:
A method cleaning a contaminate solvent used to treat a gas stream, for example a contaminated glycol or a contaminated amine stream, by vacuum evaporation using a mechanically-maintained horizontally-orientated thin film evaporator, where the contaminant material is recovered from the thin film in solvent- free form, as either a heavy organic material or as free flowing salts.
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