Invention Application
WO2015112444A1 METHODS AND SYSTEMS FOR MEASURING PERIODIC STRUCTURES USING MULTI-ANGLE X-RAY REFLECTANCE SCATTEROMETRY (XRS)
审中-公开
使用多角度X射线反射散射测量（XRS）测量周期结构的方法和系统
- Patent Title: METHODS AND SYSTEMS FOR MEASURING PERIODIC STRUCTURES USING MULTI-ANGLE X-RAY REFLECTANCE SCATTEROMETRY (XRS)
- Patent Title (中): 使用多角度X射线反射散射测量（XRS）测量周期结构的方法和系统
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Application No.: PCT/US2015/011753Application Date: 2015-01-16
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Publication No.: WO2015112444A1Publication Date: 2015-07-30
- Inventor: POIS, Heath A. , REED, David A. , SCHUELER, Bruno W. , SMEDT, Rodney , FANTON, Jeffrey T.
- Applicant: REVERA, INCORPORATED
- Applicant Address: 3090 Oakmead Village Drive Santa Clara, California 95051 US
- Assignee: REVERA, INCORPORATED
- Current Assignee: REVERA, INCORPORATED
- Current Assignee Address: 3090 Oakmead Village Drive Santa Clara, California 95051 US
- Agency: BERNADICOU, Michael A. et al.
- Priority: US14/161,942 20140123
- Main IPC: G01B15/00
- IPC: G01B15/00 ; G01N23/223 ; H01L21/66
Abstract:
Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS) are disclosed. For example, a method of measuring a sample by X-ray reflectance scatterometry involves impinging an incident X-ray beam on a sample having a periodic structure to generate a scattered X-ray beam, the incident X-ray beam simultaneously providing a plurality of incident angles and a plurality of azimuthal angles. The method also involves collecting at least a portion of the scattered X-ray beam.
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