Invention Application
WO2015169624A1 SUBSTRATE PRE-TREATMENT FOR CONSISTENT GRAPHENE GROWTH BY CHEMICAL DEPOSITION
审中-公开
化学沉积物中一致性石墨生长的基质预处理
- Patent Title: SUBSTRATE PRE-TREATMENT FOR CONSISTENT GRAPHENE GROWTH BY CHEMICAL DEPOSITION
- Patent Title (中): 化学沉积物中一致性石墨生长的基质预处理
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Application No.: PCT/EP2015/058962Application Date: 2015-04-24
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Publication No.: WO2015169624A1Publication Date: 2015-11-12
- Inventor: STRUDWICK, Andrew-James , SCHWAB, Matthias Georg , MÜLLEN, Klaus , SACHDEV, Hermann , WEBER, Nils-Eike , BINDER, Axel
- Applicant: BASF SE , MAX-PLANCK-GESELLSCHAFT ZUR FÖRDERUNG DER WISSENSCHAFTEN E.V.
- Applicant Address: 67056 Ludwigshafen DE
- Assignee: BASF SE,MAX-PLANCK-GESELLSCHAFT ZUR FÖRDERUNG DER WISSENSCHAFTEN E.V.
- Current Assignee: BASF SE,MAX-PLANCK-GESELLSCHAFT ZUR FÖRDERUNG DER WISSENSCHAFTEN E.V.
- Current Assignee Address: 67056 Ludwigshafen DE
- Agency: MAIWALD PATENTANWALTS GMBH
- Priority: EP14166997.8 20140505
- Main IPC: C01B31/04
- IPC: C01B31/04
Abstract:
The present invention relates to a process for preparing graphene, comprising (i) providing in a chemical deposition chamber a substrate which has a surface S1, (ii) subjecting the substrate to a thermal pre-treatment while feeding at least one gaseous or supercritical oxidant into the chemical deposition chamber so as to bring the surface S1 into contact with the at least one gaseous or supercritical oxidant and obtain a pre-treated surface S2, (iii) preparing graphene on the pre-treated surface S2 by chemical deposition.
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