Invention Application
- Patent Title: MANUFACTURING A CONDUCTIVE NANOWIRE LAYER
- Patent Title (中): 制造导电纳米层
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Application No.: PCT/GB2015/051378Application Date: 2015-05-11
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Publication No.: WO2015177510A1Publication Date: 2015-11-26
- Inventor: DALTON, Alan Brian , SATO, Lester Taku , LARGE, Matthew , RUMSBY, Philip Thomas
- Applicant: M-SOLV LIMITED
- Applicant Address: Oxonian Park Langford Locks Kidlington Oxford GB
- Assignee: M-SOLV LIMITED
- Current Assignee: M-SOLV LIMITED
- Current Assignee Address: Oxonian Park Langford Locks Kidlington Oxford GB
- Agency: FORSYTHE, Dominic
- Priority: GB1408949.4 20140520
- Main IPC: H01L31/18
- IPC: H01L31/18 ; G02F1/1343 ; H01B1/22
Abstract:
Methods and apparatus for manufacturing a conductive thin film are provided. In one arrangement, compositions of nanowires having different mean aspect ratios are mixed together and applied as a layer on a substrate. In other arrangements a single composition of nanowires is processed in order to increase an aspect ratio variance and the processed composition is applied as a layer on a substrate. The layers thus applied provide an improved balance of electrical conductivity to transparency and are expected to provide improved isotropy in the in-plane conductivity.
Information query
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