Invention Application
WO2016044179A2 ELECTRONIC STRUCTURES STRENGTHENED BY POROUS AND NON-POROUS LAYERS, AND METHODS OF FABRICATION
审中-公开
由多孔和非多孔层增强的电子结构以及制造方法
- Patent Title: ELECTRONIC STRUCTURES STRENGTHENED BY POROUS AND NON-POROUS LAYERS, AND METHODS OF FABRICATION
- Patent Title (中): 由多孔和非多孔层增强的电子结构以及制造方法
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Application No.: PCT/US2015050026Application Date: 2015-09-14
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Publication No.: WO2016044179A2Publication Date: 2016-03-24
- Inventor: UZOH CYPRIAN EMEKA , KATKAR RAJESH
- Applicant: INVENSAS CORP
- Assignee: INVENSAS CORP
- Current Assignee: INVENSAS CORP
- Priority: US201462050728 2014-09-15
- Main IPC: H01L25/07
- IPC: H01L25/07
Abstract:
Integrated circuits (ICs 110) are attached to a wafer (120W). A stabilization layer (404) is formed over the wafer to strengthen the structure for further processing. Unlike a conventional mold compound, the stabilization layer is separated from at least some wafer areas around the ICs by one or more gap regions (450) to reduce the thermo- mechanical stress on the wafer and hence the wafer warpage. Alternatively or in addition, the stabilization layer can be a porous material having a low horizontal elastic modulus to reduce the wafer warpage, but having a high flexural modulus to reduce warpage and otherwise strengthen the structure for further processing. Other features and advantages are also provided.
Information query
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