Invention Application
WO2016160800A1 BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS
审中-公开
含硼含量的化合物，组合物和沉积含硼的膜的方法
- Patent Title: BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS
- Patent Title (中): 含硼含量的化合物，组合物和沉积含硼的膜的方法
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Application No.: PCT/US2016/024703Application Date: 2016-03-29
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Publication No.: WO2016160800A1Publication Date: 2016-10-06
- Inventor: LEI, Xinjian , KIM, Moo-Sung
- Applicant: AIR PRODUCTS AND CHEMICALS, INC.
- Applicant Address: 7201 Hamilton Boulevard Allentown, PA 18195-1501 US
- Assignee: AIR PRODUCTS AND CHEMICALS, INC.
- Current Assignee: AIR PRODUCTS AND CHEMICALS, INC.
- Current Assignee Address: 7201 Hamilton Boulevard Allentown, PA 18195-1501 US
- Agency: ROSSI, Joseph D. et al.
- Priority: US15/079,585 20160324; US62/140,570 20150331
- Main IPC: C07F5/02
- IPC: C07F5/02 ; C07F5/05 ; C23C16/34
Abstract:
Described herein are boron-containing precursor compounds, and compositions and methods comprising same, for forming boron-containing films. In one aspect, the film is deposited from at least one precursor having the following Formula I or II described herein.
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