发明申请
- 专利标题： RANDOM WAVE MASK GENERATION
- 专利标题（中）： 随机波纹生成
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申请号： PCT/US2015/026328申请日： 2015-04-17
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公开(公告)号： WO2016167790A1公开(公告)日： 2016-10-20
- 发明人: FARINA VARGAS, Xavier , BORELL BAYONA, M. Isabel , MARTINEZ BARAMBIO, Angel
- 申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
- 申请人地址： 11445 Compaq Center Drive West Houston, Texas 77070 US
- 专利权人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
- 当前专利权人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
- 当前专利权人地址： 11445 Compaq Center Drive West Houston, Texas 77070 US
- 代理机构： WOODS, Ariana et al.
- 主分类号： B41J29/38
- IPC分类号： B41J29/38 ; B41J2/04 ; B41J2/07 ; B41J2/21
摘要：
Example implementations relate to random wave mask generation. Some examples may distribute data points in a mask area based on a probability density function. The probability density function may have a maximum probability density located at a first edge and a second edge of the mask area. Some examples may also identify a wave curve that fits the data points. The wave curve may include oscillating waveforms of varying amplitudes. Some examples may also generate a random wave mask based on the wave curve.
IPC分类:
