发明申请
- 专利标题： LITHOGRAPHIC APPARATUS AND METHOD FOR LOADING A SUBSTRATE
- 专利标题（中）： 用于装载基板的平面设备和方法
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申请号： PCT/EP2016/061587申请日： 2016-05-23
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公开(公告)号： WO2016198255A1公开(公告)日： 2016-12-15
- 发明人: SOETHOUDT, Abraham, Alexander , POIESZ, Thomas
- 申请人： ASML NETHERLANDS B.V.
- 申请人地址： P.O. Box 324 5500 AH Veldhoven NL
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： P.O. Box 324 5500 AH Veldhoven NL
- 代理机构： DUNG, S.
- 优先权： EP15171545.5 20150611
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A lithographic apparatus comprises a support table and a gas extraction system. The gas extraction system is configured to extract gas from a gap between the base surface of the support table and a substrate through at least one gas extraction opening when the substrate is being lowered onto the support table. The lithographic apparatus is configured such that gas is extracted from the gap at a first loading flow rate when the distance between the substrate and the support plane is greater than a threshold distance and gas is extracted from the gap at a second loading flow rate when the distance between the substrate and the support plane is less than the threshold distance, wherein the second loading flow rate is lower than the first loading flow rate.
IPC分类:
