Invention Application
- Patent Title: LIGHT SOURCE WITH DIFFRACTIVE OUTCOUPLING
- Patent Title (中): 具有偏差输出的光源
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Application No.: PCT/EP2016/059220Application Date: 2016-04-26
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Publication No.: WO2017054937A1Publication Date: 2017-04-06
- Inventor: DE BOER, Dirk, Kornelis, Gerhardus , VERSCHUUREN, Marcus, Antonius , SOUREN, Anne , JAGT, Hendrik, Johannes, Boudewijn
- Applicant: PHILIPS LIGHTING HOLDING B.V.
- Applicant Address: High Tech Campus 45 5656 AE Eindhoven NL
- Assignee: PHILIPS LIGHTING HOLDING B.V.
- Current Assignee: PHILIPS LIGHTING HOLDING B.V.
- Current Assignee Address: High Tech Campus 45 5656 AE Eindhoven NL
- Agency: VAN EEUWIJK, Alexander, Henricus, Walterus et al.
- Priority: EP15187285.0 20150929
- Main IPC: F21K99/00
- IPC: F21K99/00 ; F21V8/00 ; H01L33/50
Abstract:
An illumination device comprising a plurality of solid state light sources and a concentrating wave length converter arranged to inject light from said light sources through at least one entrance surface and to extract wave length converted light from at least one exit surface, comprising a structured layer provided on said exit surface, said structured layer having a structure period less than 5 micrometers, thereby enabling out-coupling through the exit surface by a combination of refraction and diffraction. In a situation where the angle of incidence on a surface is within a limited range, a combination of refraction and diffraction may provide a superior out-coupling from that surface.
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