The present invention relates to a thin film comprising: carbon; oxygen; and a metal selected from a group consisting of aluminum, titanium, hafnium, tantalum, zirconium, and tungsten and, more particularly, to a metal-carbide-oxide thin film comprising, on the basis of the total atomic percentage: 5 to 85% of carbon, 5 to 60% of oxygen, and 5 to 40% of a metal. The metal-carbide-oxide thin film of the present invention is formed by being deposited through a single injection process of a reactant precursor, such that the thickness of a thin film may be reduced. Thus, it is possible to simplify processes and reduce manufacturing costs, and thus improve productivity. In addition, a method for manufacturing the metal-carbide-oxide thin film of the present invention may control the content ratio of each component in the thin film by changing deposition conditions, and thus may control the physical properties, such as strength, etch resistance, and conductivity, etc., of the manufactured thin film. Thus, it is advantageous to manufacture a thin film having properties suitable for the intended use.