Invention Application
- Patent Title: CONFLICT MASK GENERATION
- Patent Title (中): 冲突的面具生成
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Application No.: PCT/CN2015/098655Application Date: 2015-12-24
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Publication No.: WO2017107125A1Publication Date: 2017-06-29
- Inventor: JIN, Jun , OULD-AHMED-VALL, Elmoustapha
- Applicant: INTEL CORPORATION , JIN, Jun
- Applicant Address: 2200 Mission College Boulevard Santa Clara, California 95054 US
- Assignee: INTEL CORPORATION,JIN, Jun
- Current Assignee: INTEL CORPORATION,JIN, Jun
- Current Assignee Address: 2200 Mission College Boulevard Santa Clara, California 95054 US
- Agency: SHANGHAI PATENT & TRADEMARK LAW OFFICE, LLC
- Main IPC: G06F13/16
- IPC: G06F13/16
Abstract:
Single Instruction, Multiple Data (SIMD) technologies are described. A processing device can include a processor core and a memory. The processor core can generate a first bitmap comprising a plurality of bits, where the plurality of bits includes a first bit that represents a first memory location. The processor core can determine that the value of the first bit is equal to the value of a second bit in the first bitmap. The processor core can determine the location of the second bit in relation to the first bit in the first bitmap. The processor core can generate a second bitmap including a third bit indicating that the first bit is the last bit in the first bitmap with the same value as the second bit.
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