Invention Application
WO2017115138A1 COBALT-CONTAINING FILM FORMING COMPOSITIONS, THEIR SYNTHESIS, AND USE IN FILM DEPOSITION
审中-公开
含有钴的成膜组合物，它们的合成和用于膜沉积
- Patent Title: COBALT-CONTAINING FILM FORMING COMPOSITIONS, THEIR SYNTHESIS, AND USE IN FILM DEPOSITION
- Patent Title (中): 含有钴的成膜组合物，它们的合成和用于膜沉积
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Application No.: PCT/IB2016/001940Application Date: 2016-12-12
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Publication No.: WO2017115138A1Publication Date: 2017-07-06
- Inventor: GATINEAU, Satoko , KIMURA, Mikiko , DUSSARRAT, Christian , GIRARD, Jean-Marc , BLASCO, Nicolas
- Applicant: L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE
- Applicant Address: 75 Quai D'orsay F-75007 Paris FR
- Assignee: L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE
- Current Assignee: L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE
- Current Assignee Address: 75 Quai D'orsay F-75007 Paris FR
- Agency: CONAN, Philippe
- Priority: US14/986,286 20151231
- Main IPC: C23C16/18
- IPC: C23C16/18 ; C23C16/34 ; C23C16/42 ; C23C16/455 ; C07F9/00
Abstract:
Cobalt-containing film forming compositions, their preparation, and their use for the vapor deposition of films are disclosed. The cobalt-containing film forming compositions comprise silylamide-containing precursors, particularly Co[N(SiMe 3 ) 2 ] 2 (NMe 2 Et) and/or Co[N(SiMe 3 ) 2 ] 2 (NMeEt 2 ).
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