Invention Application
WO2017156195A1 APPARATUS AND METHODS TO REMOVE UNBONDED AREAS WITHIN BONDED SUBSTRATES USING LOCALIZED ELECTROMAGNETIC WAVE ANNEALING 审中-公开
使用局部化电磁波退火去除粘合衬底中的无粘结区域的装置和方法

APPARATUS AND METHODS TO REMOVE UNBONDED AREAS WITHIN BONDED SUBSTRATES USING LOCALIZED ELECTROMAGNETIC WAVE ANNEALING
Abstract:
An electromagnetic wave irradiation apparatus and methods to bond unbonded areas in a bonded pair of substrates are disclosed. The unbonded areas between the substrates are eliminated by thermal activation in the unbonded areas induced by electromagnetic wave irradiation having a wavelength selected to effect a phonon or electron excitation. A first substrate of the bonded pair of substrates absorbs the electromagnetic radiation and a portion of a resulting thermal energy transfers to an interface of the bonded pair of substrates at the unbonded areas with sufficient flux to cause opposite sides the first and second substrates to interact and dehydrate to form a bond (e.g., Si-O-Si bond).
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