Invention Application
- Patent Title: RETICLE PROCESSING SYSTEM
- Patent Title (中): 加工系统
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Application No.: PCT/US2017/029585Application Date: 2017-04-26
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Publication No.: WO2017189695A1Publication Date: 2017-11-02
- Inventor: STRASSNER, James D. , CARLSON, Charles , VOPAT, Robert Brent , BLAHNIK, Jeffrey
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: 3050 Bowers Avenue Santa Clara, California 95054 US
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: 3050 Bowers Avenue Santa Clara, California 95054 US
- Agency: SERVILLA, Scott S.
- Priority: US15/140,633 20160428
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
Provided herein are approaches for processing reticle blanks. In one approach, a reticle processing system includes a support assembly having a plate coupled to a frame, and a carrier assembly coupled to the support assembly. In one approach, the carrier assembly includes a carrier base coupled to the plate, a reticle disposed over the carrier base, and a carrier shield disposed over the reticle, wherein the carrier shield may include a central opening formed therein, allowing for placement and extraction of the reticle. In one approach, when the carrier assembly is placed atop the support assembly, a plurality of pins extend from the plate through corresponding openings in the carrier base, the plurality of pins supporting the carrier assembly so the carrier base, the reticle, and the carrier shield are each independently supported and vertically separated from one another.
Information query
IPC分类: