Invention Application
WO2018060518A1 SEMICONDUCTOR DEVICE AND METHOD FOR FORMING A SEMICONDUCTOR DEVICE
审中-公开
半导体器件和用于形成半导体器件的方法
- Patent Title: SEMICONDUCTOR DEVICE AND METHOD FOR FORMING A SEMICONDUCTOR DEVICE
- Patent Title (中): 半导体器件和用于形成半导体器件的方法
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Application No.: PCT/EP2017/074962Application Date: 2017-10-02
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Publication No.: WO2018060518A1Publication Date: 2018-04-05
- Inventor: BESLING, Willem Frederik Adrianus , VAN DER AVOORT, Casper , TAK, Coenraad Cornelis , PIJNENBURG, Remco Henricus Wilhelmus , WUNNICKE, Olaf , GOOSSENS, Martijn
- Applicant: AMS INTERNATIONAL AG
- Applicant Address: Rietstrasse 4 8640 Rapperswil CH
- Assignee: AMS INTERNATIONAL AG
- Current Assignee: AMS INTERNATIONAL AG
- Current Assignee Address: Rietstrasse 4 8640 Rapperswil CH
- Agency: EPPING HERMANN FISCHER PATENTANWALTSGESELLSCHAFT MBH
- Priority: EP16191885.9 20160930
- Main IPC: B81B7/00
- IPC: B81B7/00
Abstract:
A semiconductor device (10) comprises a substrate body (11), an environmental sensor (12), a cap body (13) and a volume of gas (14). The environmental sensor (12) and the volume of gas (14) are arranged between the substrate body (11) and the cap body (13) in a vertical direction (z) which is perpendicular to the main plane of extension of the substrate body (11), and at least one channel (15) between the substrate body (11) and the cap body (13) connects the volume of gas (14) with the environment of the semiconductor device (10) such that the channel (15) is permeable for gases.
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