Invention Application
- Patent Title: HIGHLY STABLE AND ALKALINE CLEANING SOLUTIONS AND SOLUBLE SURFACTANT
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Application No.: PCT/EP2019/052756Application Date: 2019-02-05
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Publication No.: WO2019154797A1Publication Date: 2019-08-15
- Inventor: THEINER, Eric , SMITH, Buford Brian , YACOUB, Khalil , MEYERS, Larry
- Applicant: EVONIK DEGUSSA GMBH
- Applicant Address: Rellinghauser Straße 1-11 45128 Essen DE
- Assignee: EVONIK DEGUSSA GMBH
- Current Assignee: EVONIK DEGUSSA GMBH
- Current Assignee Address: Rellinghauser Straße 1-11 45128 Essen DE
- Agency: EVONIK PATENT ASSOCIATION
- Priority: EP18155322.3 20180206
- Main IPC: C07C229/26
- IPC: C07C229/26 ; C11D1/10 ; C11D17/00 ; C11D11/00 ; C07C229/24 ; C07C229/46
Abstract:
Cleaning solution comprising a) one or more surfactant(s) according to Formula (I), wherein R 1 is a linear, branched, or cyclic, saturated or unsaturated aliphatic group having from 3 to 7 carbon atoms or an aryl group having 6 or 7 carbon atoms or an aIkylaryl group having 7 carbon atoms; and R 2 and R 3 may be identical or different and are bivalent alkyl radicals with two to four carbon atoms; and R 4 , R 5 , and R 6 may all be identical or two of them may be identical or all may be different and are selected from the group consisting of ethyl group, 1-methylmethane group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, or tert-butyl group; and Χ 1 , X 2 and X 3 may all be identical or two of them may be identical or all may be different and are selected from the group consisting of OH and Ο - Y + , wherein Y + is a cation; and m is 0 or 1, n is 0, 1, 2 or 3; and wherein n is 1, 2 or 3, if m = 0 and if R 1 comprises a tertiary carbon atom attached to the nitrogen atom; b) one or more alkaline compound(s); and c) water Surfactant according to formula (I). Use of said cleaning solution in industrial cleaning or consumer cleaning applicaitons.
Information query