A photoetching device provided with power-off protection apparatuses, the device comprising a base (1), a platform (11) arranged on the base (1), a photoetching mechanism (4) arranged above the platform (11), a driving mechanism (2) for realizing the movement of the photoetching mechanism (4) relative to the platform (11), and power-off protection apparatuses (8) for realizing the power-off of the driving mechanism (2) when the photoetching mechanism (4) goes beyond a preset movement stroke. Motion can be stopped in a timely manner when motion is out of control, thereby preventing damage caused by the photoetching mechanism (4) flying out due to separation.