In order to enable generation of more dense plasma in a vessel with a greater volume, the plasma generation device according to the present disclosure is provided with a high-frequency circuit (20) that has an inductive load and a high-frequency power source (22) that supplies high-frequency electric power to the inductive load, and a reactor vessel that is configured so as to be able to be depressurized and that generates a plasma by applying high-frequency electric power to the inductive load. The inductive load is constituted by a spiral antenna coil (21) that is arranged so as to wind around the reactor vessel, the antenna coil being divided into at least two or more parts. The high-frequency circuit (20) has a plurality of paths (23) where each of the at least two or more parts of the antenna coil (21) are provided.