Invention Application
- Patent Title: DISPERSION OF CARBON NANOSTRUCTURES
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Application No.: PCT/CN2021/127046Application Date: 2021-10-28
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Publication No.: WO2023070439A1Publication Date: 2023-05-04
- Inventor: CHOUDHARY, Saeed , LIU, Tianqi
- Applicant: CABOT CORPORATION , WANG, Shi-Lin
- Applicant Address: Two Seaport Lane, Suite 1400; Cabot (China) Limited, 558 Shuangbai Road, Minhang District
- Assignee: CABOT CORPORATION,WANG, Shi-Lin
- Current Assignee: CABOT CORPORATION,WANG, Shi-Lin
- Current Assignee Address: Two Seaport Lane, Suite 1400; Cabot (China) Limited, 558 Shuangbai Road, Minhang District
- Agency: LIU, SHEN & ASSOCIATES
- Main IPC: C08K3/04
- IPC: C08K3/04 ; C09D5/24 ; C09D7/61
Abstract:
A composition contains 5-15 wt% CNS-derived species and a polymer resin having a hydroxyl content of at least 1.5 wt% and a melt viscosity of at least 8 Pa.s at a shear rate of 0.1 s1 at a temperature 60 ℃ greater than the highest temperature at which the resin undergoes a thermal transition. The polymer resin further has either a solubility in a 1:1 (w/w) mixture of butyl acetate and propylene glycol methyl ether acetate of at least 5 wt%, an acid number of at least 100, or both.
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