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1.发明公开
公开(公告)号：EP3167024A4
公开(公告)日：2018-03-21
申请号：EP15818291
申请日：2015-06-24
发明人： DASKIEWICH SCOTT , MUNCY BRENT , WASILCZYK GEORGE
CPC分类号： B24B37/24 , B24D3/32 , B24D3/34 , B24D11/001 , B24D11/003 , C08G18/72
摘要： Polishing materials suitable for polishing hard surfaces, media including the polishing material, and methods of forming and using the polishing materials and media are disclosed. Exemplary polishing materials have a relatively high hard segments:soft segments ratio and exhibit relatively high removal rates and/or relatively high process yields.
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2.发明公开
公开(公告)号：EP3328584A1
公开(公告)日：2018-06-06
申请号：EP16831376.5
申请日：2016-07-28
CPC分类号： B24B37/24 , C08G18/10 , C08G18/12 , C08G18/3206 , C08G18/4854 , C08G18/6674 , C08G18/7621 , C08G2101/005 , C08J9/0066 , C08J2205/044 , C08J2363/02 , C08J2375/08 , C08G18/3814
摘要： A polymeric material suitable for use in lapping processes, media including the polymeric material, systems including the media, and methods of forming and using the polymeric material are disclosed. The polymeric material can be used to lap hard surfaces, such as sapphire surfaces. The lapping process can be performed after a grinding process and before a polishing process.
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3.发明公开POLISHING MATERIAL FOR POLISHING HARD SURFACES, MEDIA INCLUDING THE MATERIAL, AND METHODS OF FORMING AND USING SAME 审中-公开磨料的磨削硬质表面用形成及其用途介质材料和方法
公开(公告)号：EP3167024A1
公开(公告)日：2017-05-17
申请号：EP15818291.5
申请日：2015-06-24
IPC分类号： C09K3/14
CPC分类号： B24B37/24 , B24D3/32 , B24D3/34 , B24D11/001 , B24D11/003 , C08G18/72
摘要： Polishing materials suitable for polishing hard surfaces, media including the polishing material, and methods of forming and using the polishing materials and media are disclosed. Exemplary polishing materials have a relatively high hard segments:soft segments ratio and exhibit relatively high removal rates and/or relatively high process yields.
摘要翻译： 适用于抛光硬质表面，介质包括抛光材料抛光材料，以及形成和使用该抛光材料和介质的方法是游离缺失光盘。 示例性的抛光材料具有相对高的硬链段：软链段的比例和表现出相对高去除速率和/或相对高的工艺产量。
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