公开(公告)号：EP4265321A1

公开(公告)日：2023-10-25

申请号：EP22168738.7

申请日：2022-04-19

申请人： ABB SCHWEIZ AG

发明人： BLEIL, Stefan ,  BECKER, Christoph ,  GIBBONS, Stephen ,  SYDES, Daniel

IPC分类号： B01D53/30 ,  G01N33/00 ,  G05B23/02 ,  B01D46/79 ,  G01N1/22

摘要： The invention relates to a system for continuous control of a state of a sample handling device (20), comprising: an analyser device (10), configured for analysing a continuous gas sample; the sample handling device (20), configured for receiving the continuous gas sample and feeding the continuous gas sample to the analyser device (10); and a liquid supplying device (30), configured for selectively supplying the sample handling device (20) with a liquid, wherein the liquid dissolves at least one solid component deposited on a filter of the sample handling device (20), thus creating a liquid additive, wherein the sample handling device (20) is configured for mixing the liquid additive with the continuous gas sample, thus providing a mixed continuous gas sample, wherein the sample handling device (20) is configured for feeding the mixed continuous gas sample to the analyser device (10) through a heated line (40), wherein the analyser device (10) is configured for analysing the fed mixed continuous gas sample, wherein analysing the fed mixed continuous gas sample comprises determining a gas composition of the fed mixed continuous gas sample, and wherein the analyser device (10) is configured for determining the state of the sample handling device (20) depending on the determined gas composition of the fed mixed continuous gas sample, wherein the sample handling device (20) is supplied with the liquid controlled by the analyser device (10).