公开(公告)号：EP0893684B1

公开(公告)日：2004-11-10

申请号：EP98113283.0

申请日：1998-07-16

申请人： EBARA CORPORATION

发明人： Miyasaka, Matsuho ,  Takayama, Hirokazu ,  Amaya, Kenji ,  Aoki, Shigeru

IPC分类号： G01N17/02 ,  G01N17/00

CPC分类号： G01N17/02

公开(公告)号：EP0893684A1

公开(公告)日：1999-01-27

申请号：EP98113283.0

申请日：1998-07-16

申请人： EBARA CORPORATION

发明人： Miyasaka, Matsuho ,  Takayama, Hirokazu ,  Amaya, Kenji ,  Aoki, Shigeru

IPC分类号： G01N17/02 ,  G01N17/00

CPC分类号： G01N17/02

摘要： An object to be analyzed for corrosion and corrosion prevention is divided into a plurality of adjacent regions of plural types by a dividing plane, with one of the adjacent regions being referred to as an attentional region with a boundary as the dividing plane and the other as a non-attentional region with a boundary as the dividing plane. An initial current density or an initial potential is imparted to each element of the boundary of the non-attentional region to effect a boundary element analysis for determining a relationship between a potential and a current density in each the element. A potential distribution and a current density distribution in the attentional region in its entirety are determined, using the relationship between the potential and the current density in each the element of the boundary of the non-attentional region as a boundary condition for the attentional region. An element analysis is effected on the non-attentional region to determine a potential distribution and a current density distribution in the non-attentional region in its entirety, using the relationship between the potential and the current density in each element of the boundary of the attentional region as a boundary condition for the non-attentional region. Therefore, a potential distribution and a current density distribution across the regions can continuously be analyzed.

摘要翻译： 要防腐蚀和防腐蚀的分析对象通过分割平面被分成多个相邻的多个类型的区域，其中一个相邻区域被称为具有作为分割面的边界的注意区域，而另一个被称为 具有边界作为分割平面的非注意区域。 将初始电流密度或初始电位赋予非注意区域的边界的每个元素，以进行边界元素分析，以确定每个元素中的电位和电流密度之间的关系。 使用非注意区域的边界的每个元素中的电势和电流密度之间的关系作为注意区域的边界条件来确定整个注意区域中的电位分布和电流密度分布。 在非注意区域上进行元素分析，以使用注意边界的每个元素中的电位和电流密度之间的关系确定整个非注意区域中的电位分布和电流密度分布 区域作为非注意区域的边界条件。 因此，可以连续分析跨区域的电位分布和电流密度分布。

公开(公告)号：EP1113094A3

公开(公告)日：2004-04-28

申请号：EP00125141.2

申请日：2000-11-17

申请人： EBARA CORPORATION

发明人： Amaya, Kenji, No.202 Mezon-Yoshimune ,  Aoki, Shigeru ,  Miyasaka, Matsuho

IPC分类号： C25D21/12

CPC分类号： C25D21/12

摘要： A plating analysis method is disclosed for electroplating in a system in which resistance of an anode and/or a cathode cannot be neglected. This method comprises giving a three-dimensional Laplace's equation, as a dominant equation, to a region containing a plating solution; discretizing the Laplace's equation by the boundary element method; giving a two-dimensional or three-dimensional Poisson's equation dealing with a flat surface or a curved surface, as a dominant equation, to a region within the anode and/or the cathode; discretizing the Poisson's equation by the boundary element method or the finite element method; and formulating a simultaneous equation of the discretized equations to calculate a current density distribution i and a potential distribution ∅ in the system. The method can obtain the current density and potential distributions efficiently for a plating problem requiring consideration for the resistance of an electrode. The method also optimizes the structure of a plating bath for uniformizing current, which tends to be concentrated in the outer peripheral portion of the cathode, thereby making the plating rate uniform.

公开(公告)号：EP1113094A2

公开(公告)日：2001-07-04

申请号：EP00125141.2

申请日：2000-11-17

申请人： EBARA CORPORATION

发明人： Amaya, Kenji, No.202 Mezon-Yoshimune ,  Aoki, Shigeru ,  Miyasaka, Matsuho

IPC分类号： C25D21/12

CPC分类号： C25D21/12

摘要： A plating analysis method is disclosed for electroplating in a system in which resistance of an anode and/or a cathode cannot be neglected. This method comprises giving a three-dimensional Laplace's equation, as a dominant equation, to a region containing a plating solution; discretizing the Laplace's equation by the boundary element method; giving a two-dimensional or three-dimensional Poisson's equation dealing with a flat surface or a curved surface, as a dominant equation, to a region within the anode and/or the cathode; discretizing the Poisson's equation by the boundary element method or the finite element method; and formulating a simultaneous equation of the discretized equations to calculate a current density distribution i and a potential distribution ∅ in the system. The method can obtain the current density and potential distributions efficiently for a plating problem requiring consideration for the resistance of an electrode. The method also optimizes the structure of a plating bath for uniformizing current, which tends to be concentrated in the outer peripheral portion of the cathode, thereby making the plating rate uniform.

摘要翻译： 公开了一种电镀分析方法，用于在不能忽视阳极和/或阴极电阻的系统中进行电镀。 该方法包括给出包含电镀溶液的区域的三维拉普拉斯方程作为主导方程; 用边界元法离散拉普拉斯方程; 将平面或曲面的二维或三维泊松方程作为主导方程提供给阳极和/或阴极内的区域; 用边界元法或有限元法离散泊松方程; 并制定离散方程的联立方程，以计算系统中的电流密度分布i和电势分布∅。 该方法可以有效地获得电流密度和电势分布，用于需要考虑电极电阻的电镀问题。 该方法还优化了用于均匀化电流的电镀槽的结构，电流趋于集中在阴极的外周部分，由此使电镀速率均匀。