Method and apparatus for exposing a photosensitive material
    2.
    发明公开
    Method and apparatus for exposing a photosensitive material 有权
    Verfahren und Apparat zum Belichten von lichtempfindlichem材料

    公开(公告)号:EP1083460A1

    公开(公告)日:2001-03-14

    申请号:EP99202942.1

    申请日:1999-09-09

    IPC分类号: G03C5/02 G03C7/18

    CPC分类号: G03C7/18 G03C5/02 G03C5/04

    摘要: The invention relates to a method and apparatus for exposing a photosensitive material such as colour negative film, colour reversal film and colour photographic paper, for evaluating the photographic characteristics of said photosensitive material. At least two different areas of the material are exposed differently and at least one light beam is used. At least one light beam is split into at least first and second parts which are equal to each other. At least two different areas are respectively exposed to the first part of the said light beam and the second part of the said light beam.

    摘要翻译: 本发明涉及用于曝光感光材料如彩色底片,彩色反转膜和彩色相纸的方法和装置,用于评估所述感光材料的照相特性。 材料的至少两个不同区域被不同地曝光,并且使用至少一个光束。 至少一个光束被分成至少彼此相等的第一和第二部分。 至少两个不同的区域分别暴露于所述光束的第一部分和所述光束的第二部分。