公开(公告)号：EP1568802A1

公开(公告)日：2005-08-31

申请号：EP03788699.1

申请日：2003-08-20

申请人： Nikko Materials Company, Limited

发明人： KUMAGAI, Masashi, c/o Nikko Materials Co., Ltd. ,  HANAFUSA, Mikio, c/o Nikko Materials Co., Ltd.

IPC分类号： C25D1/04 ,  C25D3/38

CPC分类号： C25D3/38 ,  H05K1/09 ,  Y10T428/31678 ,  Y10T428/31681

摘要： It is an object of the present invention to obtain a low-profile electrolytic copper foil with a small surface roughness on the side of the rough surface (the opposite side from the lustrous surface) in the manufacture of an electrolytic copper foil using a cathode drum, and more particularly to obtain an electrolytic copper foil which allows fine patterning, and which is superior in terms of elongation and tensile strength at ordinary temperatures and high temperatures. Furthermore, it is an object of the present invention to obtain a copper electrolytic solution for this purpose. This copper electrolytic solution contains as additives an organo-sulfur compound and a quaternary amine compound with a specific skeleton expressed by the following general formula (1) which is obtained by an addition reaction between a compound which has one or more epoxy groups per molecule and an amine compound, followed by a quaternization of the nitrogen.
(In general formula (1), R 1 and R 2 each indicate a group selected from the group consisting of a hydroxyalkyl group, an ether group, an aromatic group, an aromatic-substituted alkyl group, an unsaturated hydrocarbon group and an alkyl group, R 3 indicates a benzyl group, an allyl group or an alkyl group, A indicates an epoxy compound residue, X 1 - indicates Cl - , Br - or CH 3 SO 4 - , and n indicates an integer of 1 or greater.)

摘要翻译： 它是使用阴极鼓上的本发明的一个目的是获得具有在电解铜箔的制造中对粗糙表面的一侧上的表面粗糙度小（从表面光泽的相反侧）的低轮廓电解铜箔 ，并且更具体地，得到其允许精细图案化电解铜箔的，并且所有这是在常温下和高温下的伸长率和拉伸强度方面是优异的。 进一步，这是本发明的一个目的是获得用于此目的的铜电解液。 这种铜电解液包含作为添加剂，以有机硫化合物和由下述通式（1）所有其通过加成反应具有一个或每分子以上环氧基的化合物和之间获得表达特定骨架的季胺化合物 到胺化合物，通过氮的季铵化随后。 （在通式（1）中，R1和R2各自表示选自羟烷基，醚基的烷基，以芳族基团中选择的基团，芳香族substituiertem烷基，上不饱和的烃基和在 基，R 3表示苄基，以烯丙基或烷基，A表示与环氧化合物的残基，X1 < - >表示氯< - >，溴< - >或CH 3 SO 4 < - >，并且n表示为1整数 或更大。）