CONTROLLED ATOM SOURCE
    1.
    发明公开
    CONTROLLED ATOM SOURCE 审中-公开
    GESTEUERTE ATOMQUELLE

    公开(公告)号:EP3123253A2

    公开(公告)日:2017-02-01

    申请号:EP15718979.6

    申请日:2015-03-24

    IPC分类号: G04F5/14 H05H3/02

    CPC分类号: H05H3/02 G04F5/14 G04F5/145

    摘要: A method of generating at least one trapped atom of a specific species, the method comprising the steps of: positioning a sample material comprising a specific species in a vacuum; generate an atomic vapour of the specific species by irradiating the sample material with a first laser; trapping one or more atoms from the generated atomic vapour.

    摘要翻译: 一种产生特定物质的至少一个捕获的原子的方法,所述方法包括以下步骤:将包含特定物质的样品材料(18)定位在真空中(14); 通过用第一激光器(12)照射样品材料来产生特定物质的原子蒸气(20); 从产生的原子蒸气中捕获一个或多个原子。