摘要:
The invention relates to a method of producing a sheet comprising through pores. The inventive method comprises the following steps, consisting in: preparing a sheet having a thickness of between 5νm and a few tens of micrometers which can be etched by means of a lithographic operation; producing a mask on one face of the sheet, said mask having an etching selectivity S of at least 5; depositing a layer of photosensitive resin on the aforementioned mask; creating through pores in the layer of resin by means of photolithography; through etching the mask through the pores in the resin layer; and through anisotropic etching the sheet from the pores in the mask in order to produce pores in the sheet which have a shape factor that is greater than 5. The invention is suitable for use in the production of micronic and submicronic filters.