公开(公告)号：EP1586106A1

公开(公告)日：2005-10-19

申请号：EP03781059.5

申请日：2003-12-30

Applicant: Cebt Co., Ltd.

Inventor： KIM, Ho Seob ,  AHN, Seung Joon ,  KIM, Dae Wook

IPC: H01J37/06 ,  G03F9/00

CPC classification number: H01J3/028 ,  H01J3/10 ,  H01J37/067 ,  H01J37/15 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/24465 ,  H01J2237/24507

Abstract: The present invention provides a new extractor for a micro-column and an alignment method of the aperture of said extractor and an electron emitter for a micro-column. Further, the present invention provides a measuring system, a method for measuring, and an alignment method using the principle of said alignment.

公开(公告)号：EP0978139A1

公开(公告)日：2000-02-09

申请号：EP98922869.7

申请日：1998-04-24

Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE

Inventor： BAPTIST, Robert

IPC: H01J49/42

CPC classification number: H01J49/4215 ,  H01J49/0018 ,  H01J2237/1205

Abstract: The invention concerns a miniature device for generating a transverse multipolar field, or a miniature device for filtering or deviating or focusing charged particles, comprising n longitudinal miniature conducting bars (32, 34, 36, 38), with polygonal cross section, and arranged about a longitudinal axis (AA').

公开(公告)号：EP2879155B1

公开(公告)日：2018-04-25

申请号：EP13195345.7

申请日：2013-12-02

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Frosien, Jürgen ,  Winkler, Dieter ,  Cook, Benjamin John

IPC: H01J37/05 ,  H01J37/09 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/09 ,  H01J37/1472 ,  H01J37/1474 ,  H01J37/244 ,  H01J2237/0453 ,  H01J2237/0475 ,  H01J2237/1205 ,  H01J2237/21 ,  H01J2237/2448 ,  H01J2237/24592 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: A scanning charged particle beam device (1) configured to image a specimen (8) is described. The scanning charged particle beam device includes a source (2) of charged particles, a condenser lens (220, 950) for influencing the charged particles, an aperture plate (5) having at least two aperture openings (5A-5E) to generate at least two primary beamlets (4A, 4E) of charged particles, at least two deflectors (6A-6E) configured to individually deflect the at least two primary beamlets of charged particles so that each primary beamlet appears to come from a different source (2A-2C) , wherein the at least two deflectors are multi-pole deflectors (26a-26E) with an order of poles of 8 or higher, a multi-pole deflector (438) with an order of poles of 8 or higher, an objective lens (10) configured to focus the at least two primary beamlets onto the specimen, wherein the objective lens is a retarding field compound lens, a beam separator (13, 413, 414, 215) configured to separate the at least two primary beamlets from at least two signal beamlets, a beam bender (423, 479) , or a deflector or a mirror configured to deflect the at least two signal beamlets, wherein the beam bender is selected from the group consisting of: a hemispherical beam bender and a beam bender having at least two curved electrodes, and at least two detector elements (9A-9E) configured to individually measure the at least two signal beamlets.

公开(公告)号：EP3268979A1

公开(公告)日：2018-01-17

申请号：EP16762718.1

申请日：2016-04-13

Applicant: Hermes Microvision Inc. ,  Ren, Weiming ,  Li, Shuai ,  Liu, Xuedong ,  Chen, Zhongwei

Inventor： REN, Weiming ,  LI, Shuai ,  LIU, Xuedong ,  CHEN, Zhongwei

IPC: H01J49/00 ,  G01N23/00 ,  G21K5/10 ,  G21K7/00

CPC classification number: H01J37/28 ,  H01J37/1472 ,  H01J2237/04924 ,  H01J2237/083 ,  H01J2237/1205 ,  H01J2237/1516

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.

公开(公告)号：EP2434522B8

公开(公告)日：2014-07-23

申请号：EP11195133.1

申请日：2003-07-08

Applicant: Canon Kabushiki Kaisha ,  Hitachi Ltd.

Inventor： Ono, Haruhito ,  Nagae, Kenichi ,  Takakuwa, Masaki ,  Nakayama, Yoshinori ,  Muto, Harunobu

IPC: H01J37/317 ,  H01J37/12 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/1205

公开(公告)号：EP2434522B1

公开(公告)日：2014-06-04

申请号：EP11195133.1

申请日：2003-07-08

Applicant: Canon Kabushiki Kaisha ,  Hitachi Ltd.

Inventor： Ono, Haruhito ,  Nagae, Kenichi ,  Takakuwa, Masaki ,  Nakayama, Yoshinori ,  Muto, Harunobu

IPC: H01J37/317 ,  H01J37/12 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/1205

公开(公告)号：EP1091386B1

公开(公告)日：2012-11-21

申请号：EP00308685.7

申请日：2000-10-03

Applicant: LUCENT TECHNOLOGIES INC.

Inventor： Katsap, Victor ,  Kruit, Peter ,  Moonen, Daniel ,  Waskiewicz, Warren Kazmir

IPC: H01J37/065 ,  H01J37/317 ,  H01J37/30 ,  H01J37/12

CPC classification number: H01J37/065 ,  H01J37/12 ,  H01J2237/1205 ,  H01J2237/31774

公开(公告)号：EP1956631B1

公开(公告)日：2012-06-20

申请号：EP08156483.3

申请日：2002-12-17

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Lanio, Stefan

IPC: H01J37/141 ,  H01J37/145 ,  H01J37/317

CPC classification number: H01J37/141 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/145 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/1405

公开(公告)号：EP1679734B1

公开(公告)日：2010-04-07

申请号：EP04031042.7

申请日：2004-12-30

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Adamec, Pavel

IPC: H01J37/28 ,  H01J37/12 ,  H01J37/14

CPC classification number: H01J37/12 ,  H01J37/14 ,  H01J37/28 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/1405 ,  H01J2237/1501 ,  H01J2237/2611 ,  H01J2237/2817

公开(公告)号：EP1160824B1

公开(公告)日：2009-12-30

申请号：EP01304634.7

申请日：2001-05-25

Applicant: eLith LLC ,  Agere Systems Guardian Corporation

Inventor： Katsap, Victor ,  Kruit, Pieter ,  Moonen, Daniel ,  Waskiewicz, Warren K.

IPC: H01J37/12 ,  H01J37/317 ,  H01J37/065

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J3/18 ,  H01J37/063 ,  H01J37/12 ,  H01J37/3174 ,  H01J2237/065 ,  H01J2237/12 ,  H01J2237/1205 ,  H01J2237/3175 ,  H01J2237/31774