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11.发明公开
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12.发明授权
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13.发明公开Strahlungsmessgerät zur Messung einer ionisierenden Strahlung 失效Strahlungsmessgerätzur Messung einer ionisierenden Strahlung。
公开(公告)号：EP0263386A2
公开(公告)日：1988-04-13
申请号：EP87114101.6
申请日：1987-09-26
发明人： Foth, Reinhard , Rohmund, Achim
CPC分类号： G01T1/185
摘要： Ein Strahlungsmeßgerät mit einer Strahlungsdetektoranordnung (2) und einer Meßanordnung (6) und einer daran angeschlossenen Anzeigeanordnung (12) zur Anzeige des in der Meßanordnung (6) gebildeten Meßwertes enthält außerdem eine zweite Meßanordnung (7), deren Ausgang (9) über eine Selektionsanordnung (10) an den Meßwerteingang (11) der Meßanordnung (12) anschließbar ist. Die erste Meßanordnung (6) enthält eine Integrationsanordnung (16), die zur Bildung eines genauen Meßwertes vorgesehen ist. Die zweite Meßanordnung (7), die nur während der Betätigung eines Bedienungselementes (18) an die Anzeigeanordnung (12) angeschlossen ist, enthält eine Momentanwertanordnung (17), die aus den Zählimpulsraten (4) der Strahlungsdetektoranordnung (2) einen Momentanwert bildet, der in der Anzeigeanordnung (12) deutlich als Momentanwert gekennzeichnet angezeigt wird.
摘要翻译： 包括辐射检测器装置（2）和测量装置（6）的辐射测量装置和连接到其上的用于显示在测量装置（6）中形成的测量值的显示装置（12）还包括第二测量装置（7） ，其输出（9）可以经由选择装置（10）连接到测量装置（12）的测量值输入（11）。 第一测量装置（6）包含用于形成精确测量值的集成装置（16）。 当操作元件（18）被致动时，仅连接到显示装置（12）的第二测量装置（7）包含瞬时值排列（17），其从所述显示装置的计数脉冲率（4）形成 放射线检测器装置（2）在显示装置（12）上被清楚地识别为瞬时值的瞬时值。
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公开(公告)号：EP3761066B1
公开(公告)日：2024-01-10
申请号：EP19759986.3
申请日：2019-02-27
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公开(公告)号：EP3872530A1
公开(公告)日：2021-09-01
申请号：EP19875060.6
申请日：2019-10-16
摘要： A radiation detection device includes a detection element including a substrate having a first surface and a second surface on the opposite side with respect to the first surface, a first electrode arranged on the first surface, a second electrode being adjacent to the first electrode in a first direction, a third electrode being adjacent to the first electrode in a second direction intersecting the first direction; a fourth electrode being adjacent to the third electrode in the first direction and being adjacent to the second electrode in the second direction and a fifth electrode arranged on the first surface of the substrate and arranged between the first electrode and the second electrode, between the first electrode and the third electrode, between the second electrode and the fourth electrode, and between the third electrode and the fourth electrode; a wiring layer arranged on the second surface side and including a first wiring connected to the first electrode, a second wiring connected to the second electrode, a third wiring connected to the third electrode, and a fourth wiring connected to the fourth electrode; and a circuit element arranged opposite to the wiring layer and connected to the first wiring, the second wiring, the third wiring, and the fourth wiring.
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公开(公告)号：EP3743740B1
公开(公告)日：2021-06-30
申请号：EP19701564.7
申请日：2019-01-14
发明人： NORBERG, Gunnar , MUNOZ, Daniel
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公开(公告)号：EP3761066A1
公开(公告)日：2021-01-06
申请号：EP19759986.3
申请日：2019-02-27
摘要： A Detection element includes a substrate having a first surface and a second surface opposing the first surface, substrate comprising: a substrate provided with a through hole having inner diameters that differ from each other at two points along the thickness of substrate; a through electrode disposed in through hole; a first electrode connected to through electrode and disposed on the first surface; a patterned electrode connected to through electrode and disposed on the second surface; and a second electrode disposed on the first surface and spaced apart from the first electrode.
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公开(公告)号：EP3743740A1
公开(公告)日：2020-12-02
申请号：EP19701564.7
申请日：2019-01-14
申请人： C-Rad Imaging AB
发明人： NORBERG, Gunnar , MUNOZ, Daniel
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公开(公告)号：EP3196921B1
公开(公告)日：2020-09-02
申请号：EP15841522.4
申请日：2015-09-10
申请人： Fujikura, Ltd.
发明人： ARAI, Daisuke
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公开(公告)号：EP1943543B1
公开(公告)日：2018-06-06
申请号：EP06799747.8
申请日：2006-10-10
CPC分类号： G01R19/0061
摘要： A detector and method are disclosed for sensing an intensity of an electron beam. An exemplary detector includes a multilayer composite structure having a conductive core, an insulating layer formed on the conductive core, and an outer conductive layer electrically connected to a voltage potential and formed on the insulating layer. A support is configured to locate the conductive core in alignment with an electron beam generator, between an electron beam generator and a target area, and within a direct path of an electron beam to be generated by the electron beam generator.
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